IISER Pune
INDIAN INSTITUTE OF SCIENCE EDUCATION AND RESEARCH (IISER) PUNE
where tomorrow’s science begins today
An Autonomous Institution, Ministry of Human Resource Development, Govt. of India
Links
Seminars and Colloquia

Physics

Atomic Layer Deposition of Nanostructure Materials and Their Emerging Applications  
 
Wed, Mar 15, 2017,   03:30 PM at Physics Seminar Room 31, 2nd Floor, Main Building

Dr. Anil U. Mane
Argonne National Laboratory, USA

Abstract : 
Atomic level self-limiting material growth mechanism in atomic layer deposition (ALD) method offers the various advantages, such as precise control layer thickness, uniform composition over very high aspect ratio three dimensional features and large scale batch processing. In addition, a variety of nanostructure materials for instance metals, oxides, nitrides, sulphides and their composites are synthesized by various type ALD methods. This make ALD route more attractive for existing nanoelectronics products improvement as well as emerging applications such as photonics, MEMS/NEMS, nanomedicine, biotechnology, nuclear, high energy physics, renewable energy and water technology. In this presentation, I will discuss nanostructure materials design, synthesis, and engineering by ALD methods especially using in-situ growth analysis tools (e.g. QCM, RGA, FTIR, electrical, etc.) and various ALD materials applications. 

homecolloquia_seminars